Thursday 14 Dec 2017: NEST Seminar: Group IV compounds and tunable index silicon nitride for multiplatform integrated photonics
Dr Frederic Gardes - University of Southampton
Group IV compounds and tunable index silicon nitride for multiplatform integrated photonics
Dr Frederic Gardes
Optoelectronics Research Centre
University of Southampton
Over the last decade, Silicon Photonics has established itself as a mature technology for the fabrication of low-cost, scalable integrated optical components. Silicon-On-Insulator (SOI) has been widely accepted as the ideal fabrication platform for silicon photonics components, allowing the implementation of high-index contrast waveguides using CMOS-compatible processes. A wide range of highly performing SOI-devices aimed at applications for the next-generation optical networking have already been demonstrated, such as ultra-low loss waveguides, optical filters, high-speed optical transceivers, as well as the components for all-optical signal processing. Nevertheless, to increase circuit density and functionality, a range of materials are required to enable back-end-of-line (BEOL) fabrication of multilayer waveguiding systems and associated components such as light sources, modulators and detectors. We demonstrate a range of techniques and deposition methods leading to the fabrication of components such as Ge/SiGe electro-absorption modulators or BEOL SiN waveguides enhancing the platform capability for applications such as temperature insensitive CWDM, all optical signal processing through enhanced non-linear characteristics and suspended devices for sensing applications.